StockerYale, Inc. will unveil the SNF laser with increased line uniformity options at Semicon West 2006 in San Francisco, CA, July 11-13, booth #7764.
The LasirisTM SNF laser, widely known for its versatility in machine vision applications, is now available with increased line uniformity options. Uniformity is the measure of the intensity distribution along the laser line and is an important feature for applications that require precision. Using special design techniques and depending on the laser model, the line uniformity of the standard SNF laser has been improved to ± 25, 20, or 15%.
In addition, the SNF laser now operates at powers of up to 100 mW at 660 nm with an automatic power control (APC) circuit. The availability of this new 100 mW power option provides machine vision users with a higher power alternative for their specialized high speed inspection, positioning and mapping applications.
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