Enhancements for pattern location and alignment software are said to boost throughput in challenging semiconductor and electronic manufacturing applications.
VISION-SYSTEM SOFTWARE FOR TOUGH TASKS
PatMax XLC (eXtremely Low Contrast) helps vision systems find barely visible objects or patterns in grainy or faint images, like those produced by powerful magnification techniques such as Scanning Electron Microscopes (SEMs). The software also minimizes the need for expensive lighting and optics upgrades to analyze noisy, low-contrast images. PatMax SA (Scene Alignment) provides partial-match alignment that eliminates the need for the entire pattern to be present in an image to obtain accurate results. By enabling portions of the trained model to be outside the field of view, the software reduces manual operator intervention, increasing throughput in applications such as defect review stations.
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