Epix (environmental protection ion exchange) gas-phase filters remove trace amounts of airborne molecular contamination (AMC). The filters remove acidic, basic, and neutral salt AMCs by chemical adsorption through ion exchange and physical absorption. They are specially designed to eliminate ammonia, amine, and organic contamination that negatively affect DUV lithography applications. The filters remove AMCs at ppb and ppt levels. Features include no gas emissions of chemical contaminants from the filter material and no discharge of adsorped impurities for fluctuations in temperature.

Ebara Technologies Inc., 51 Main Ave., Sacramento, CA 95838, (916) 920-5451.